Nanoimprint lithography (NIL) is a nanofabrication procedure that could allow the mass manufacture of nanodevices. The NIL process utilizes heat and pressure to create exact copies of the master template with polymer resist. Although the replicating process is cost and time effective, the cost of the master template prohibits many smaller companies or research lab from using this procedure. Because of the cost and fragility of silicon template, the master template cannot be easily replaced or repaired if it breaks or wears out during the fabrication process. In this research, we created positive and negative copies of the original master template with a low-cost and easy-to-handle polymer – polydimethylsiloxane (PDMS). The surface of these copies were treated in order to lower the surface energy, thus allowing easy release of any subsequent copies. The soft backing also allows these copies to be peeled off the easily, which allow them to serve as the master template for many device copies.
(Oral) Lo, J., Horsley, D.,Skinner, J., Fabrication of Large Arrays of Plasmonics Nanofeatures via Double Casting, SPIE Photonics West 2012, San Francisco, United States